EUV: Keep it Clean

Among the technical hurdles still impeding extreme-ultraviolet lithography is the lack of a thin transparent film, called a pellicle, to protect EUV photomasks from contamination. The consensus now is that EUV won’t have the luxury of a pellicle to help keep masks clean. Since EUV masks are highly sensitive to contamination, that’s a problem.

1 Comment(s)

Share your thoughts.

Write a Comment

To comment please Log In.

resistion

Contamination of the mask happens in the exposure tool during exposure. They have trouble fixing it for the tool itself.

11/16/2012 6:29 AM EST

Latest Issue
March 2012
Web Issue

Issue Archive

February 2012

January 2012

Complete Issue Archive

Know More.

EE Times Confidential delivers timely business analysis, unique insights, and actionable intelligence you can't find anywhere else.

TopicDetailConfidential.GenericData.PromotionBox2.Keys: SubscriptionLevel=None; UserState=NotLoggedIn;

WHO'S IN THIS ISSUE

Apple computer
Samsung
Toshiba
Elpida
Qualcomm
Avalanche

Fujitsu
Ramtron
Renesas
Adesto
Avalanche
Grandis

About Us

EE Times Confidential is a premium online intelligence report for business executives; investors, strategic marketers and financial analysts in the global electronics industry. More >