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October 13, 2011

Update: IMEC’s E-Beam Move Underscores EUV Delays

Update: IMEC’s E-Beam Move Underscores EUV Delays
IMEC has begun working on an e-beam maskless lithography component. The chip researcher nevertheless says it remains committed to extreme ultraviolet and 193-nm wavelength optical lithography research while keeping an eye on e-beam and nano-imprint lithography.

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